Silicon nitride membranes – 200um substrate thickness

Silicon nitride Si₃N₄ support membranes are suitable where carbon or plastic films are not appropriate. These silicon nitride membranes are extremely flat and smooth which significantly reduces the need for frequent re-focusing when scanning across large areas. The membranes have high stability under the electron beam and, being relatively chemically inert, are resistant to most chemicals with the exception of dilute HF, hot H₂SO₄ and free fluorine. The mechanical stability of the membrane allows a range of microscopy techniques, such as TEM, SEM and AFM, to be used for a variety of nanotechnology experiments. Cells, fibres and particles etc. can be mounted directly onto the support film and examined.

They are available with different window sizes on a silicon support frame designed to fit a standard 3mm TEM holder and in a range of membranes thicknesses from 10 to 500nm. The silicon nitride membranes are manufactured under clean room conditions and are chemically cleaned before packaging. Supplied as 10 support membranes in a grid box.

200µm substrate thickness